We have compiled a list of manufacturers, distributors, product information, reference prices, and rankings for Projection Exposure Equipment.
ipros is IPROS GMS IPROS One of the largest technical database sites in Japan that collects information on.

Projection Exposure Equipment - List of Manufacturers, Suppliers, Companies and Products

Projection Exposure Equipment Product List

1~4 item / All 4 items

Displayed results

Full panel mass production projection exposure equipment 'CMS-Ck' ★ Demo now available!

Improves resolution and alignment accuracy, compatible with mass production processes. Adopts UV-LED light sources to reduce running costs.

The "CMS (Cerma Micro Stepper) - Ck" is a projection exposure device capable of fine pattern exposure, compatible with full-size substrates of 650×550mm. It uses a UV-LED light source as the standard light source. It is suitable for applications that require high precision, high resolution (L/S) of 2μm, and high productivity, starting with interposers. 【Features】 ■ Supports mass production processes from L/S = 1.4/1.4μm ■ Die-by-die alignment & global alignment methods ■ Capable of chip-first processes ■ Equipped with a tilt mechanism for each shot to improve yield *For more details, please refer to the documentation. Additionally, we have a clean room where our products can be evaluated. If you would like a demo, please feel free to contact us. (We can accommodate surrounding processes including lamination, coating, and development.)

  • CMS2.jpg
  • CMS1.jpg
  • others

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration

Projection Exposure Device "MRS Series" adopts UV-LED light source.

Wafer size post-process projection exposure equipment MRS adopts UV-LED light source as the standard light source (enabling reduction of running costs without sacrificing productivity!)

■ For 8 inches and below, "single exposure method" is available, while for 12 inches, "step and repeat exposure method" can be selected. ■ Achieves high productivity due to a wide exposure area. ■ Has a deep focal depth, with numerous achievements in the MEMS and RF filter industries. ■ Compatible with TAIKO wafers. ■ Global alignment method. ■ High-precision alignment exposure is achieved with a high-rigidity frame. ■ Focus map mechanism is standard equipment.

  • MRS.jpg
  • MR S.jpg
  • Stepper

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration